Journal of Photopolymer Science and Technology

Featured article

Volume 36 (2023) Issue 1 Pages 7-10

The Photopolymer Science and Technology Award

Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, Takeo Watanabe

The Photopolymer Science and Technology Award No. 232100, the Best Paper Award 2022, was presented to Atsunori Nakamoto, Shinji Yamakawa, Tetsuo Harada, and Takeo Watanabe (Center for EUV Lithography, Laboratory of Advanced Science and Technology for Industry, University of Hyogo) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 35, (2022) 61-65, entitled “Grazing-Incidence Soft-X-ray Scattering for the Chemical Structure Size Distribution Analysis in EUV Resist”.

Volume 36 (2023) Issue 1 Pages 5-6

The Photopolymer Science and Technology Award

Seihou Jinnai, Yutaka Ie

The Photopolymer Science and Technology Award No. 222100, the Best Paper Award 2021, was presented to Seihou Jinnai and Yutaka Ie (The Institute of Scientific and Industrial Research (SANKEN), Osaka University) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 34, (2021) 285-290, entitled “Synthesis, Properties, and Photovoltaic Characteristics of Arch- and S-shaped Naphthobisthiadiazole-based Acceptors”.

Volume 36 (2023) Issue 1 Pages 3-4

The Photopolymer Science and Technology Award

Tomotaka Tsuchimura

The Photopolymer Science and Technology Award No. 212100, the Best Paper Award 2021, was presented to Tomotaka Tsuchimura (FUJIFILM Corporation) for his outstanding contribution published in Journal of Photopolymer Science and Technology, 33, (2020) 15-26, entitled “Recent Progress in Photo-Acid Generators for Advanced Photopolymer Materials”.

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2023 Volume 36 Issue 5

Synthesis of Monomers Having a 2-Hydroxypyridyl Group and Their Application to Photo-adhesive Materials Masahiro Furutani, Wataru Usui, Chiharu Nishibata
Theory of Photodecomposable Base in Chemically Amplified Resist Mark Neisser
Electron Generation in Tin-oxo Cage Extreme Ultraviolet Photoresists Najmeh Sadegh, Quentin Evrard, Nicola Mahne, Angelo Giglia, Stefano Nannarone, Albert M. Brouwer
Insight into Charge Carrier Recombination Mechanisms in Lead Based Mixed Cation and Halide Perovskite Keishiro Goshima, Wakana Matsuda, Minh Anh Truong, Ryuji Kaneko, Ai Shimazaki, Tomoya Nakamura, Atsushi Wakamiya, Yasuhiro Tachibana

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