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Podrobnosti e-časopisu
Název: Simulation of Semiconductor Processes and Devices (SISPAD), International Conference on
Zkrácený: INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES & DEVICES
Alternativní: Simulation of Semiconductor Processes and Devices (SISPAD), International Conference on
Alternativní: Simulation of Semiconductor Processes and Devices
ISSN: 1946-1569
LCCN: 2009200104
Recenzováno: Ne
 
Dostupnost: IEEE Electronic Library (IEL)
 
Dostupný od 1996
Dostupné pro: NTK
 
Kategorie:
Engineering: Electrical Engineering